Jun 16, 2015

De Beers’ Element Six To Make Presentations on Synthetics At Conference

Andrew Bennett, principal research scientist and Eugene Anoikin, manager of product applications and engineering at De Beers’ Element Six, will both be presenting separate papers at the Conference on Lasers and Electro-Optics/Europe and the European Quantum Electronics Conference (CLEO/Europe-EQEC) on Wednesday, June 24.

Element Six, a company of the De Beers Group, is the world’s leading producer of  synthetic diamond supermaterials. Its supermaterial solutions are used in applications such as cutting, grinding, drilling, shearing and polishing, while the extreme properties of synthetic diamond beyond hardness are already opening up new applications in a wide array of industries such as optics, power transmission, water treatment, semiconductors and sensors, the Company says.

Bennett will present an “invited” paper   titled “Diamond—An Engineer’s Best Friend,”; and Anoikin’s will present one titled “Diamond Optical Windows with Sub-Wavelength Surface Structures.”

“Authored by Andrew Bennett and Daniel Twitchen, ‘Diamond—An Engineer’s Best Friend’,  explores diamond’s remarkable physical and chemical properties and its performance capabilities as an optical engineering material,” said the Company in a statement. “Element Six’s Bennett will review and explore several case studies, summarising key progress in diamond fabrication techniques, utilising chemical vapour deposition (CVD) synthesis and mechanical and chemical processing, as well as solutions for integration such as mounting and anti-reflective coatings.”

“Diamond Optical Windows with Sub-Wavelength Surface Structures”  is authored by Eugene Anoikin and Alexander Muhr.    Anoikin who will be presenting it will “address design and fabrication of sub-wavelength structured surfaces (SWS) on synthetic diamond windows”, the Company said.  Anoikin will also “touch on how diamond has become a material of choice for high power laser windows in multi-kilowatt CO2 laser systems, a key enabler of applications such as EUV lithography”.